Ferroelectric Thin Films III, Symposium Held in San Francisco, California on April 13 - 16, 1993. Materials Research Society Symposium Proceedings, Volume 310

Abstract

This symposium showcased the advancement in processing technology and basic scientific understanding of ferroelectric thin films. The conference highlighted the use of novel materials science analysis techniques to characterize ferroelectric thin film materials and devices and to relate the nanoscale features and responses detected by these techniques to ferroelectric, electrooptic and piezoelectric properties. Examples of newer material analysis techniques included atomic force microscopy, electron spin resonance, high resolution transmission electron microscopy, combined Rutherford backscattering- nuclear reaction analysis and the use of optical interferometry to provide a three dimensional representation of field induced displacement.

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Document Details

Document Type
Technical Report
Publication Date
Apr 16, 1993
Accession Number
ADA273394

Entities

People

  • Bruce A. Tuttle
  • Edward R. Myers
  • Poul K. Larsen
  • Seshu B. Desu

Organizations

  • Materials Research Society

Tags

Communities of Interest

  • Advanced Electronics

DTIC Thesaurus Topics

  • Ceramic Materials
  • Chemical Synthesis
  • Chemistry
  • Crystal Structure
  • Crystallography
  • Crystals
  • Electromagnetic Fields
  • Material Degradation Processes
  • Materials
  • Materials Laboratories
  • Materials Processing
  • Materials Science
  • Materials Testing
  • Measurement
  • Phase Diagrams
  • Piezoceramics
  • Transition Temperature

Fields of Study

  • Physics

Readers

  • Materials Science and Engineering.
  • Systems Analysis and Design
  • Thin Film Deposition Science.

Technology Areas

  • Microelectronics
  • Microelectronics - Graphene