The Importance of Vibrationally Excited Nitrogen in Silicon Nitride Deposition Systems
Abstract
We have investigated the kinetics of N2(X, v) quenching by silane. These studies were a first step in understanding the kinetic processes important in silicon nitride coating systems using the remote plasma enhanced chemical vapor deposition technique. Our experiments were carried out in a discharge-flow reactor and used metastable energy transfer diagnostics to detect N2(X, v) in vibrational levels from zero up to at least 13. (Author)
Document Details
- Document Type
- Technical Report
- Publication Date
- Aug 01, 1993
- Accession Number
- ADA274874
Entities
People
- Lawrence G. Piper
Organizations
- Physical Sciences (United States)