Low Voltage Electron Beam Lithography

Abstract

In order to develop a low-energy-spread, high brightness electron source using negative electron affinity technology, it is necessary to survey the effects of cathode structure and activation on energy spread, lateral velocity distribution, peak current, and lifetime. Most research in NEAPC technology has gone into detector applications, to improve photoyield at low light intensity and high wavelength, Intevac is a leader in this area. The scientific understanding and technical expertise developed in this effort are important to achieving our goal of an electron source optimized for low-energy electron applications; however, it will be necessary to investigate other cathode properties (peak brightness, energy spread) under a substantially different operating regime (high light intensity, small emission area, high extraction field).

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Document Details

Document Type
Technical Report
Publication Date
Jan 01, 1994
Accession Number
ADA275648

Entities

People

  • Aaron Baum
  • Roger Fabian W. Pease

Organizations

  • Stanford University

Tags

Communities of Interest

  • Energy and Power Technologies

DTIC Thesaurus Topics

  • Charged Particles
  • Computational Fluid Dynamics
  • Computational Science
  • Computer Programs
  • Computers
  • Differential Equations
  • Electromagnetic Fields
  • Electron Beam Lithography
  • Electron Beams
  • Electron Microscopes
  • Electron Microscopy
  • Finite Element Analysis
  • Magnetic Fields
  • Mass Spectrometry
  • Numerical Analysis
  • Optics
  • Three Dimensional

Fields of Study

  • Physics

Readers

  • Defense Technology Research and Development.
  • Pulsed Power and Plasma Physics.

Technology Areas

  • Directed Energy
  • Microelectronics