Development of Large Area rf Induction Plasmas for Cost Effective Diamond

Abstract

Progress continues on the development of a large area rf induction plasma system. An early problem with a hole in the deposition pattern has been assigned to poor gas distribution. The injection port has been modified to eliminate the hole . 30 microns films on quartz substrates have been fabricated. Plasma modeling and gas modeling have been initiated. A downstream process gas monitor has been proven. A smaller scale system for evaluating rf power vs. rate data is under construction. And, a data acquisition and process control package has been identified and ordered from National Instruments. Diamond, Large-area, rf, Induction.

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Document Details

Document Type
Technical Report
Publication Date
Oct 01, 1993
Accession Number
ADA275888

Entities

People

  • R. C. Hendry
  • Ronald A. Rudder

Organizations

  • RTI International

Tags

Communities of Interest

  • Ground and Sea Platforms

DTIC Thesaurus Topics

  • Computer Programs
  • Data Acquisition
  • Electronic Equipment
  • Energy Systems
  • Exhaust Systems
  • Films
  • Flow
  • Flow Rate
  • Generators
  • Mass Flow
  • Materials
  • Military Research
  • Phase Diagrams
  • Radio Frequency Devices
  • Substrates
  • Thermal Conductivity
  • Thick Films

Readers

  • Electrical Engineering
  • Software Engineering.
  • Thin Film Deposition Science.