Development of Large Area rf Induction Plasmas for Cost Effective Diamond
Abstract
Progress continues on the development of a large area rf induction plasma system. An early problem with a hole in the deposition pattern has been assigned to poor gas distribution. The injection port has been modified to eliminate the hole . 30 microns films on quartz substrates have been fabricated. Plasma modeling and gas modeling have been initiated. A downstream process gas monitor has been proven. A smaller scale system for evaluating rf power vs. rate data is under construction. And, a data acquisition and process control package has been identified and ordered from National Instruments. Diamond, Large-area, rf, Induction.
Document Details
- Document Type
- Technical Report
- Publication Date
- Oct 01, 1993
- Accession Number
- ADA275888
Entities
People
- R. C. Hendry
- Ronald A. Rudder
Organizations
- RTI International