Microforces in Electromigration
Abstract
Theoretical description of electromigration (EM) in metallic microstructures. How EM in a small metallic system is affected by surfaces, interfaces, and extended defects e.g. grain boundaries and dislocations. Electronic aspects of EM and dynamical atom response to current; emphasizing mesoscopic systems. Calculated local transport field in very small structures: near grain boundary or dislocation; and probeability by scanning tunneling microscope. Investigated inelastic scattering effects on electrical conductivity and EM of migrating impurity. Pauli-blocking effects induce nonlinearities in the electron and atom response. Mesoscopic systems show this more strongly than bulk systems because Fermi-distribution can be strongly perturbed in state with current. Investigated impurity heating by electron current, quantummechanical dynamics of interacting atom-lattice-electron system included; found effective temperature as function of time. Net atom flux expressed in terms of effective driving force in Nernst-Einstein relation; in phonon-assisted diffusion of light interstitials driving force can be much smaller than from previous theories. Generalization to non-adiabatic effects on electron screening and direct force for EM. Investigated dynamics in complementary classical diffusion processes; First numerical simulations of atomic level EM. Significant enhancement of light interstitial EM from. Electromigration, Quantum mechanics, Mesoscopic, Transport fields.
Document Details
- Document Type
- Technical Report
- Publication Date
- Dec 01, 1993
- Accession Number
- ADA276229
Entities
People
- Richard S. Sorbello
Organizations
- University of Wisconsin–Milwaukee