Proceedings of the (37Th) International Symposium on Electron, Ion, and Photon Beams Held in San Diego, California on 1-4 June 1993.
Abstract
Partial contents: Lithographic patterning of self-assembled films; Alignment signal failure detection and recovery in real time; Marks for alignment and registration in projection electron lithography; Improvement of heterodyne alignment technique for x-ray steppers; Confocal filtering of the instantaneous image in scanned darkfield alignment; Novel on-axis interferometric alignment method with sub-10 nm precision; Focused-ion beam induced deposition of copper; Focused ion beam XeF2 etching of materials for phase-shift masks; Selective electroless plating on electron beam seeded nanostructures; Modification of polymer surfaces and the fabrication of submicron-scale functionalized structures by deep-ultraviolet and electron-beam lithography; Characteristics of ion beam assisted etching of GaAs: Surface stoichiometry; Resolution limits in electron-beam induced tungsten deposition
Document Details
- Document Type
- Technical Report
- Publication Date
- Feb 11, 1994
- Accession Number
- ADA276478
Entities
People
- Henry I. Smith
Organizations
- Massachusetts Institute of Technology