Electron Cyclotron Resonance Plasma and Thermal Oxidation Mechanisms of Germanium
Abstract
The electron cyclotron resonance (ECR) plasma oxidation and thermal oxidation mechanisms for germanium were investigated using in-situ spectroscopic and single wavelength ellipsometry. ECR plasma oxidation was performed at substrate temperatures of 80 deg to 400 deg C while thermal oxidations were performed between 400 deg to 600 deg C. Optical modeling shows that there is an interface between the oxide film and the substrate that is composed of germanium oxide and amorphous germanium. The nature of the interface and factors controlling its thickness were studied for different oxidation conditions and with various characterization methods: X-ray photoelectron spectroscopy (XPS) to confirm the optical model, capacitance-voltage (C-V) measurements to measure electronic properties, and Fourier transform infrared spectroscopy (FTIR) to deter-mine the molecular structure. Electron, Cyclotron resonance, Thermal oxidations
Document Details
- Document Type
- Technical Report
- Publication Date
- Mar 15, 1994
- Accession Number
- ADA277317
Entities
People
- Eugene A. Irene
- Y. Z. Hu
- Yaonan Wang
Organizations
- University of North Carolina at Chapel Hill