Final Report for Grant AFOSR-91-0123 (Washington University)
Abstract
Modulated molecular beam studies have been carried out in combination with scanning tunneling microscopy to determine basic mechanisms in the reactions of atomic and molecular oxygen and chlorine with Si(111) and Si(100). The effect of vibrational excitation was also studied for Cl2. We have uncovered a number of reaction mechanisms and determined activation energies and preexponential factors which had not been known previously. Quantitative reaction probabilities for atoms and molecules were determined. They differ from a 10(exp3)-10(exp5) higher reactivity for 0 over 02 to a factor of 2-10 for Cl over Cl2. Inhomogeneous decomposition of ultrathin oxides on Si(100) was studied at atomic resolution using STM. It was found that defects at step sites play no role in void nucleation. Silicon, Oxygen, Chlorine, Etching, Oxidation.
Document Details
- Document Type
- Technical Report
- Publication Date
- Jan 31, 1994
- Accession Number
- ADA277368
Entities
People
- Thomas Engel
Organizations
- University of Washington