Radiation-Induced Modifications of Allylamino-Substituted Polyphosphazenes

Abstract

A review describing efforts to synthesize allylamino-substituted polyphosphazenes and characterize their sensitivity to radiation, and determine the value of using such polymers as new and better resist materials for microlithographic applications. Polyphosphazenes, Polymers, Radiation, Microlithography

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Document Details

Document Type
Technical Report
Publication Date
May 17, 1994
Accession Number
ADA279694

Entities

People

  • G. L. Grune
  • H. R. Allock
  • M. F. Welker
  • R. T. Chern
  • V. T. Stannett

Organizations

  • Pennsylvania State University

Tags

Communities of Interest

  • Advanced Electronics
  • Weapons Technologies

DTIC Thesaurus Topics

  • Acrylic Acid
  • Chemical Engineering
  • Chemistry
  • Electron Beams
  • Engineering
  • Films
  • Gamma Rays
  • Glass Transition Temperature
  • Materials
  • Materials Science
  • Military Research
  • North Carolina
  • Polymeric Films
  • Polymers
  • Radiation
  • Transition Temperature
  • United States

Fields of Study

  • Chemistry

Readers

  • Combustion Dynamics and Shock Wave Physics.
  • Nanofabrication and Microfabrication.
  • Nuclear and Radiation Engineering.