Field-Emitter Arrays for RF Vacuum Microelectronics

Abstract

SRI International has completed the tenth quarter of a program to develop field-emitter arrays for vacuum microelectronics. We have met the first- phase program goals of 5 mA total emission, with a current density of 5 A/cm2 for at least 2 hours and demonstrated modulation of the emission current at a frequency of 1 GHz. Principal efforts involved the development of a process for forming emitter cones in small diameter apertures and with improved aspect ratios to reduce stress accumulation on film, modification of reactive ion etching chemistry to eliminate sulfur contamination of the cathode, investigation of galvanic etching resulting from a deionized-water rinse, and methods of fabricating emitters arrays with increased geometric field- enhancement factors and higher packaging densities. Variations in emission test results in cathodes at SRI and in cathodes given high-frequency tests at NRL were investigated, and an emission microscope for use in studying emitter array performance, yield, and reliability was assembled. Field-emitter array, Vacuum microelectronics, Low-capacitance cathode.

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Document Details

Document Type
Technical Report
Publication Date
May 31, 1994
Accession Number
ADA279959

Entities

People

  • C. A. Spindt

Organizations

  • SRI International

Tags

Communities of Interest

  • Advanced Electronics

DTIC Thesaurus Topics

  • Abstracts
  • Aspect Ratio
  • Chemistry
  • Contamination
  • Current Density
  • Diameters
  • Electronics Laboratories
  • Emission
  • Emitters
  • Etching
  • Fabrication
  • Frequency
  • Microelectronics
  • Microscopes
  • Packing Density
  • Reactive Ion Etching
  • Reliability

Fields of Study

  • Physics

Readers

  • Integrated Circuit Design and Technology.
  • Semiconductor Device Technology
  • Technical Research and Report Writing.

Technology Areas

  • Microelectronics
  • Microelectronics - Graphene
  • Microelectronics - Microelectromechanical Systems