Growth, Characterization and Device Development in Monocrystalline Diamond Films

Abstract

Diamond hot wire anemometers were fabricated and tested in a hybrid constant current, constant temperature mode. Wires were tested for response time, sensitivity and reproducibility, with the objective being to observe the effects of geometrical variations on these properties. Results indicated no strong correlation between geometry and response time. Sensitivity measurements also showed little difference among geometries. Research continued in the growth of boron nitride films on various substrates including Si(100), diamond (100), Cu (100) and Ni(100) via ion beam assisted electron beam evaporation. Fourier transform infrared spectroscopy and high resolution transmission electron microscopy showed that the total films on Si and diamond consisted of the sequence from the substrate: a-BN, h-BN, c-BN. The c-BN layers formed as a function of deposition temperature, ion current and thickness. The occurrence of this layer is attributed to increasing intrinsic biaxial compressive stress generated during deposition. Diamond, Hot wire anemometers, Geometry, Response time, Boron nitride films, a-BN, h-BN, c-BN, Si, Cu, Ni, Diamond, Biaxial compressive stress.

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Document Details

Document Type
Technical Report
Publication Date
Jun 01, 1994
Accession Number
ADA281146

Entities

People

  • B. R. Stoner
  • D. J. Kester
  • J. Avent
  • J. T. Glass
  • K. S. Ailey
  • Robert F Davis
  • Robert J. Nemanich

Organizations

  • North Carolina State University

Tags

Communities of Interest

  • Advanced Electronics
  • Energy and Power Technologies

DTIC Thesaurus Topics

  • Ceramic Materials
  • Chemical Engineering
  • Chemical Vapor Deposition
  • Chemistry
  • Deposition (Materials Processing)
  • Electron Microscopy
  • Energy Transfer
  • Geometry
  • Heat Transfer
  • High Resolution
  • Hot Wire
  • Hot Wire Anemometers
  • Ion Beams
  • Materials
  • Materials Science
  • Measurement
  • Spectroscopy

Readers

  • Materials Science and Engineering.
  • Nanofabrication and Microfabrication.
  • Semiconductor Device Technology

Technology Areas

  • Directed Energy
  • Directed Energy - Pulsed-Laser Deposition
  • Microelectronics
  • Microelectronics - Graphene