Development of Nanostructure Fabrication Technology and New Electron-Quantum Wave Devices

Abstract

Under the three-year grant, we have investigated and developed various nanofabrication technologies including construction of an ultra-high resolution electron beam lithography system, sub-20 nm electron beam lithography techniques, etching of sub-40 nm silicon pillars and ridges; (b) fabricated various nanoscale transistors including a number of new device structures; (c) studied quantum effects and single electron effects; (d) designed, fabricated, and investigated ultra-fast metal-semiconductor-metal photodetectors with the record speeds on various of semiconductors, including low-temperature GaAs with 510 GHz bandwidth, bulk GaAs with 300 GHz, and bulk Si with 75 GHz.

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Document Details

Document Type
Technical Report
Publication Date
Feb 15, 1994
Accession Number
ADA281724

Entities

People

  • Chia-chi Wang
  • Mark Y. Liu
  • P. B. Fischer
  • Paul B. Fischer
  • Roman Sobolewski
  • Sotiris Alexandrou
  • Stephen Y. Chou
  • Thomas Y. Hsiang
  • Waleed Khalil
  • Yue Liu
  • Yun Wang

Organizations

  • University of Minnesota

Tags

DTIC Thesaurus Topics

  • Chemistry
  • Construction
  • Electrical Engineering
  • Electron Beam Lithography
  • Electron Microscopes
  • Fabrication
  • Field Effect Transistors
  • Integrated Circuits
  • Metal-Semiconductor-Metal Photodetectors
  • Microscopes
  • Nanoscale Devices
  • Optics
  • Optoelectronics
  • Power Electronics
  • Scanning Electron Microscopes
  • Semiconductor Devices
  • Semiconductors

Fields of Study

  • Materials science

Readers

  • Integrated Circuit Design and Technology.
  • Quantum Dot Semiconductor Device Photonics and Graphene Optoelectronic Materials and THz Physics.

Technology Areas

  • Directed Energy
  • Microelectronics
  • Quantum Computing