Advanced Packaging and Integration Technologies for Microsensors. Phase 1

Abstract

Advanced microfabrication processes have been developed for producing a hermetic cover wafer with low resistance dielectrically isolated through-wafer interconnects. The feasibility of manufacturing encapsulated pressure sensors, utilizing the cover-wafer approach, has been demonstrated. Such pressure sensors represent a new generation of environmentally protected, cost effective devices. The accomplishments of Phase I include the following: the study of conversion of single crystal silicon into porous silicon; the study of conversion of porous silicon into oxide; process for producing through-wafer interconnects has been established; the stresses in the cover wafer have been investigated, which enabled the fabrication of flat cover-wafers. The surface and cross-sectional morphology of the cover wafer was investigated; hermeticity and dielectric isolation of the oxidized rings was verified; Sensors compatible with the cover- wafer approach were fabricated and tested. The new generation of sensors was designed

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Document Details

Document Type
Technical Report
Publication Date
Aug 12, 1994
Accession Number
ADA283613

Entities

People

  • A. A. Ned
  • A. D. Kurtz

Tags

Communities of Interest

  • Advanced Electronics

DTIC Thesaurus Topics

  • Anodizing
  • Ceramic Materials
  • Current Density
  • Detectors
  • Electron Microscopy
  • Fabrication
  • Films
  • Geometry
  • Leak Detectors
  • Manufacturing
  • Materials
  • Microsensors
  • Porous Materials
  • Semiconductor Devices
  • Semiconductors
  • Sensor Networks
  • Silicon Compounds

Fields of Study

  • Materials science

Readers

  • Integrated Circuit Design and Technology.
  • Surface Engineering/Surface Coating Technology.