NLO Properties of Si(OH)4 and Ge(OH)4 Clusters

Abstract

The NLO properties in terms of static and frequency-dependent hyperpolarizabilities of Si(OH)4 and Ge(OH)4 clusters are determined with an aim to understand the microscopic NLO behavior of silica. The calculated results reveal that the cluster configuration induced by the presence of a defect plays a significant role in determining the non-linear response of these clusters. In addition, instant ionization of the cluster introduces a noticeable increase in the value of second hyperpolarizability gamma

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Document Details

Document Type
Technical Report
Publication Date
Jan 01, 1994
Accession Number
ADA284514

Entities

People

  • Michael Coolidge
  • Ravindra Pandey
  • Walter Lauderdale

Organizations

  • Air Force Research Laboratory

Tags

Communities of Interest

  • Energy and Power Technologies

DTIC Thesaurus Topics

  • Air Force
  • Conjugated Polymers
  • Dipole Moments
  • Electric Fields
  • Electronics
  • Energy
  • Films
  • Frequency
  • Kerr Effects
  • Materials
  • Molecules
  • New York
  • Optical Properties
  • Physics
  • Potential Energy
  • Quantum Electronics
  • Thin Films

Readers

  • Aerosol Science/Aerosol Physics
  • Materials Science and Engineering.
  • Systems Analysis and Design