AASERT-93: Electroplating of Refractory Metals Using Haloaluminate Melts
Abstract
The main objective of this research, performed by Sven E. Eklund, a graduate student at the Univ of Tennessee, Knoxville, is to explore the fundamentals of electroplating of several refractory metals, such as tungsten and tantalum, from chlorofluoroaluminate melts and to compare with electroplating of these elements from the LiF-NaF-KF eutectic. There has been considerable interest in the electrochemistry and metallurgy of the Groups IV-B, V-B, and VI-B4 transition metals (so-called refractory metals) because of the potential use of these metals in electronic components, electrical devices, and the aerospace industry. Pure, coherent deposits of these metals were originally obtained by a method developed by Mellors and Senderoff (1) in 1965. This method uses electrolytic reduction to the metal from the ternary eutectic LiF-NaF-KF, or FLINAK. Mechanisms proposed in several articles by Senderoff and coworkers for the reduction of several metals (2-5) have spurred research into the refractory metals in molten fluorides.
Document Details
- Document Type
- Technical Report
- Publication Date
- Aug 31, 1994
- Accession Number
- ADA284859
Entities
People
- Gleb Mamantov
Organizations
- University of Tennessee system