Materials Processing and Manufacturing Technologies for Diamond Substrates Multichip Modules

Abstract

The previous quarter saw attainment of the target 1g/hr diamond deposition at 75kW, as well as full power continuous operation of the AX6600 system. In this quarter we have focused on process chemistry at full power, exploring the operating range of the AX6600 and process chemistry variables. Specific process conditions we have explored include: deposition rates from 300 mg/hr to over 900 mg/hr, operation from 50 to over 75 kW, deposition on areas from 6 diameter to 12 diameter, deposition on a variety of substrate materials and techniques for intact release of the diamond at the end of the deposition step, deposition of non-uniform films for stress/flatness control.

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Document Details

Document Type
Technical Report
Publication Date
Oct 14, 1994
Accession Number
ADA285775

Entities

People

  • Evelio Sevillano

Tags

Communities of Interest

  • Energy and Power Technologies

DTIC Thesaurus Topics

  • Chemistry
  • Conductivity
  • Diameters
  • Manufacturing
  • Materials
  • Materials Processing
  • Measurement
  • Military Research
  • Multichip Modules
  • Power Levels
  • Raman Scattering
  • Refractory Metals
  • Substrates
  • Surface Roughness
  • Temperature Control
  • Thermal Conductivity

Readers

  • Materials Science and Engineering.
  • Software Engineering
  • Thin Film Deposition Science.