Observation of Thermal Electron Detachment from Cyclo-C4F8 in FALP experiments

Abstract

The methodology for use of a flowing afterglow-Langmuir probe apparatus to measure thermal electron detachment rate coefficients is described. We determined the thermal detachment rate coefficient (1010 + or - 300/s) for cyclo-C4F(-)8 ions and the rate coefficient (1.6 + or - 0.5 x 10(exp -8)cu cm/s) for electron attachment of cyclo-C4F8 at 375 K. The sole ionic product of attachment is cyclo-C4F(-)8. The equilibrium constant for the attachment/ detachment reaction yields a free energy for attachment at 375 K of -0.63 +or - 0.02 eV, from which we estimate the electron affinity (O K value) Of Cyclo-C4F8 to be about 0.63 eV. Electron attachment, Electron detachment, Cyclo perfluorobutane

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Document Details

Document Type
Technical Report
Publication Date
Jan 01, 1994
Accession Number
ADA286035

Entities

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  • Albert A Viggiano
  • Amy E. Miller
  • John F. Paulson
  • Robert A. Morris
  • Thomas M Miller

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  • Phillips Laboratory

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  • Materials and Manufacturing Processes

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