Influences of Film Structures on Laser Damage Thresholds,

Abstract

This article takes TiO2/SiO2 and ZrO2/SiO2 film systems as examples and studies the influences of different film structures. It combines studies on measurements of optical Iosses and the effects of protective film thicknesses, making a preliminary probe into laser damage mechanisms as associated with optical thin films. (MM)

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Document Details

Document Type
Technical Report
Publication Date
Dec 15, 1994
Accession Number
ADA289647

Entities

People

  • Fan Zhengxiu
  • Wu Zhouling

Organizations

  • National Air and Space Intelligence Center

Tags

Communities of Interest

  • Advanced Electronics
  • Energy and Power Technologies

DTIC Thesaurus Topics

  • Absorption
  • Air Intelligence
  • Damage
  • Detectors
  • Experimental Data
  • Films
  • Laser Damage
  • Light Sources
  • Materials
  • Measurement
  • Membranes
  • Refraction
  • Refractive Index
  • Scattering
  • Test Equipment
  • Thickness
  • Thin Films

Fields of Study

  • Physics

Readers

  • Systems Analysis and Design
  • Thin Film Deposition Science.

Technology Areas

  • Directed Energy
  • Directed Energy - Pulsed-Laser Deposition