Low Voltage Electron Beam Lithography,

Abstract

The software has been completed for Monte-Carlo simulation of scattering of low energy electrons from a line edge using the new low voltage scattering cross-sections developed under this contract. The software properly treats crossings of all surfaces. For example between the sidewall-gap-substrate. This includes re-entrant sidewalls with an undercut. (KAR)

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Document Details

Document Type
Technical Report
Publication Date
Aug 01, 1994
Accession Number
ADA289742

Entities

People

  • R. Browning

Organizations

  • United States Naval Research Laboratory

Tags

DTIC Thesaurus Topics

  • Backscattering
  • Contracts
  • Crossings
  • Electron Beam Lithography
  • Electron Beams
  • Electrons
  • Lithography
  • Low Voltage
  • Monte Carlo Method
  • Scattering
  • Scattering Cross Sections
  • Simulations
  • Substrates
  • Voltage

Fields of Study

  • Physics

Readers

  • Electrical Engineering
  • Molecular Photonics/Laser Physics
  • Nanofabrication and Microfabrication.

Technology Areas

  • Directed Energy
  • Directed Energy - Lasers
  • Microelectronics