OEIC Ultra. A New Approach to OEIC CAD.
Abstract
Integrated optoelectronics will lead to advances in ultra-fast computing that go beyond the functionality that conventional electronics can reach through size reduction. Optoelectronic integrated circuit (OEIC) design is currently hampered by the lack of a unified computer-aided design (CAD) tool that aids in managing the complex data implicit in component, subsystem, and system-level modeling. To address the advanced CAD requirements of ULTRA, the David Sarnoff Research Center (Sarnoff) has created a hierarchical OEIC design system built using a platform- independent simulation and visualization environment supported by commercial-off- the-shelf software. Sarnoff has demonstrated integration of existing modules by graphically "wiring" them up on-screen to represent the complete design problem. Sarnoff has demonstrated how integrated visualization tools can support the design process by allowing automatic exploration of the effects of parameters and structural features on lasers and OEIC devices while the system automatically manages data flow among modules. This CAD environment will enable the ARPA ULTRA program to exploit optoelectronics at a faster place than achievable by the stand-along design approaches in use today.
Document Details
- Document Type
- Technical Report
- Publication Date
- Oct 01, 1994
- Accession Number
- ADA290349
Entities
People
- R. Amantea
Organizations
- Sarnoff Corporation