Compact Substrate Heater for Use in an Oxidizing Atmosphere.

Abstract

A compact heater, designed for the deposition of thin films at high temperatures in an oxidizing atmosphere or vacuum, is described. The heater, including an oxygen-resistant case and the attached substrate, can be loaded into a vacuum deposition chamber through a small-diameter load-lock system, and will operate in 0 to 1 atmosphere of oxygen at temperatures up to at least 800 deg C. Heat is generated resistively, and the substrates are heated directly by thermal conduction. The heater was built specifically to heat substrates during the growth of high-temperature superconducting thin films. (AN)

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Document Details

Document Type
Technical Report
Publication Date
Dec 01, 1994
Accession Number
ADA290860

Entities

People

  • J. S. Briggs
  • T. E. Jones
  • W. C. Mcginnis

Organizations

  • Naval Command, Control and Ocean Surveillance Center

Tags

Communities of Interest

  • Advanced Electronics

DTIC Thesaurus Topics

  • Atmospheres
  • Conduction (Heat Transfer)
  • Conductivity
  • Diameters
  • Electrical Conductivity
  • Films
  • Heating Elements
  • High Temperature
  • Materials
  • Measurement
  • Partial Pressure
  • Radiation
  • Substrates
  • Synthetic Materials
  • Thermal Conductivity
  • Thin Films
  • Vapor Pressure

Fields of Study

  • Physics

Readers

  • Combustion and Flow Dynamics.
  • Surface Engineering/Surface Coating Technology.
  • Thin Film Deposition Science.