Semiconductor Deposition and Etching Interactions of Laser-Generated Translationally Hot Atoms and Radicals.

Abstract

Laser vaporization of cryogenic films is employed to produce translationally fast atoms and radicals, and these kinetic-energy-enhanced species are used for studies of semiconductor etching; the results are important for the basic physics of electronics materials processing. Recent accomplishments include (1) production of a novel source of kinetic-energy-enhanced beams of Cl(2), Cl, and F atoms by laser vaporization, (2) observation of substantial enhancement of the etching rate and sustained etching of room temperature Si(100) by chlorine molecules with energies greater than or equal 3 eV, (3) scattering studies of translationally fast Cl(2) and Cl with Si(100), (4) velocity selection of the translationally fast beams for energy-resolved studies of dry etching processes, and (5) measurements of SiCl(x) product distributions as a function of substrate temperature. (jg)

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Document Details

Document Type
Technical Report
Publication Date
Dec 31, 1994
Accession Number
ADA291017

Entities

People

  • Stephen R. Leone

Organizations

  • JILA

Tags

Communities of Interest

  • Energy and Power Technologies

DTIC Thesaurus Topics

  • Chlorine
  • Dissociation
  • Dry Etching
  • Electronics
  • Energy
  • Energy Transfer
  • Etching
  • Kinetic Energy
  • Mass Spectrometers
  • Materials
  • Materials Processing
  • Measurement
  • Molecules
  • Scattering
  • Semiconductor Devices
  • Semiconductors
  • Vaporization

Readers

  • Combustion science or combustion engineering.
  • Organic Chemistry
  • Thin Film Deposition Science.

Technology Areas

  • Directed Energy
  • Microelectronics
  • Microelectronics - Graphene