The Nucleation of Crystalline Films From Vapor Phase Reactants.

Abstract

Understanding and controlling the nucleation of diamond, silicon nitride, and silicon oxynitride was the primary objective of this research program, This work has made it possible to form the desired phase under more favorable processing conditions, and has also led to better control of the resultant film microstructures and properties. In this research we have focused on the use of thin interlayers to control and enhance nucleation. In the case of silicon oxynitride, we have also demonstrated the potential for using thin interlayers to enhance materials properties (i.e., oxidation resistance). (jg)

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Document Details

Document Type
Technical Report
Publication Date
Jan 06, 1995
Accession Number
ADA291122

Entities

People

  • Brian W. Sheldon

Organizations

  • Brown University

Tags

Communities of Interest

  • Advanced Electronics

DTIC Thesaurus Topics

  • Air Force
  • Carbon Carbon Composites
  • Ceramic Materials
  • Chemical Reactions
  • Chemical Vapor Deposition
  • Chemistry
  • Films
  • Low Temperature
  • Materials
  • Materials Processing
  • Materials Science
  • Materials Testing
  • Microstructure
  • Oxidation
  • Oxidation Resistance
  • Resistance
  • Vapor Deposition

Fields of Study

  • Materials science

Readers

  • Materials Science and Engineering.
  • Quantum Dot Semiconductor Device Photonics and Graphene Optoelectronic Materials and THz Physics.
  • Surface Engineering/Surface Coating Technology.