Synthesis of Tungsten Nitrene Complexes as Precursors to Tungsten Nitride.
Abstract
Chemical vapor deposition using organometallic precursors (MOCVD) provides a method for the preparation of thin films. Low valent tungsten nitrene complexes were synthesized as potential precursors to tungsten nitride (WNx), a material used in diffusion barriers for Si or GaAs semiconductor devices. The original target precursors for MOCVD of WNx were the carbonyl-containing complexes (CO) 5-n (PR3)nW=NR, where R is an alkyl or alkyl group. Later synthetic work involved the tungsten(IV) imido (or nitrene) complexes (CO) 2I2LW equivalent NPh, which were prepared by oxidation of the zwitterionic species (CO) 5WNPhNPhC(OMe)Ph with one equivalent of I2 followed by addition of a coordinating species L (L= THF, pyridine, PMe3, P(OMe)3).
Document Details
- Document Type
- Technical Report
- Publication Date
- Jan 17, 1995
- Accession Number
- ADA291252
Entities
People
- Lisa Mcelwee-white
Organizations
- University of Florida