Influence of CO2 Continuous Laser Preprocessed Substrates on Optical Thin Film Damage Thresholds,

Abstract

As far as experimental research into the influences of CO2 laser preprocessed substrates on optical thin film damage threshold values is concerned, it was discovered that, with regard to single layer films and antireflective coatings, radiation pretreatment causes threshold values to clearly go up. At their highest, they reach 5 times those not radiation treated. However, on high reflection films, radiation pretreatment has no great influence. Using repetition frequency pulse photothermal deflection techniques, real time studies were done of corresponding relationships associated with light absorption and damage. Using pulsed time resolved light deflection technology, precise determinations were made of the locations associated with the occurrence of initial damage on samples in depth and direction. Making use of continuous modulation light deflection techniques--combining Nomarski optical microscope analysis of damage morphology--a number of significant conclusions were reached.

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Document Details

Document Type
Technical Report
Publication Date
Apr 26, 1995
Accession Number
ADA294190

Entities

People

  • Fan Zhengxiu
  • Wang Zhijiang
  • Wu Zhouling
  • Yang Gao

Organizations

  • National Air and Space Intelligence Center

Tags

DTIC Thesaurus Topics

  • Absorption
  • Air Intelligence
  • Antireflection Coatings
  • Coatings
  • Deflection
  • Films
  • Laser Beams
  • Lasers
  • Materials
  • Microscopes
  • Modulation
  • Optical Materials
  • Peak Values
  • Radiation
  • Reflection
  • Substrates
  • Thin Films

Fields of Study

  • Physics

Readers

  • Optical Physics and Photonics.
  • Thin Film Deposition Science.

Technology Areas

  • Directed Energy
  • Directed Energy - Pulsed-Laser Deposition