Effect of Ion Bombardment on Thin Film Properties,
Abstract
Oxygen ions from cold cathode ion guns have been used for bombarding when growing thin films. The effect of ion bombardment on film packing density and moisture absorption is examined. It was shown that the packing density of ZrO2, TiO2 and SiO2 that were bombarded by ions increased to over 0.9 based on the measurement given by a quartz crystal microbalance. As a result of exposure to the moisture in a wet atmosphere, the drift of peak transmission wavelength of interference filters that are made of these materials was reduced by 2/3. This suggests that ion assisted technology maybe capable of producing thin films with superior optical and mechanical properties.
Document Details
- Document Type
- Technical Report
- Publication Date
- May 05, 1995
- Accession Number
- ADA294658
Entities
People
- Jinfa Tang
- Peifu Gu
Organizations
- National Air and Space Intelligence Center