Development of a Digital X-Ray Topographic Mapping Technique for Automated, Rapid Characterization of Production GaAs Wafers.

Abstract

This research program was to develop a digital and automated x-ray topographic technique for use a rapid quality control tool in characterizing 3' GaAs wafers. The conclusions show that the DARC topography system is a tool capable of providing users with the information needed to characterize production III-V and II-VI semiconductor wafers. jg

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Document Details

Document Type
Technical Report
Publication Date
Mar 30, 1988
Accession Number
ADA294787

Entities

People

  • Alfred L. Wiltrout
  • Douglas C. Leepa
  • Ronald G. Rosemeier
  • S. B. Trivedi
  • T. S. Ananthanarayanan

Tags

Communities of Interest

  • Advanced Electronics
  • Biomedical
  • Weapons Technologies

DTIC Thesaurus Topics

  • Compound Semiconductors
  • Crystal Lattices
  • Crystal Structure
  • Crystals
  • Data Acquisition
  • Detectors
  • Diffraction
  • Geometry
  • Image Processing
  • Materials
  • Measurement
  • Optical Properties
  • Optics
  • Semiconductors
  • Two Dimensional
  • X Rays
  • X-Ray Detectors

Fields of Study

  • Materials science

Readers

  • Aerospace Engineering.
  • Computer Science/Computer Engineering/Data Science/Digital Signal Processing.
  • Semiconductor Device Technology

Technology Areas

  • Microelectronics
  • Microelectronics - Microelectromechanical Systems