Surface Modification by High Current Metal Ion Implantation.

Abstract

This report summarizes the research and development that has been carried out at Lawrence Berkeley Laboratory on metal ion implantation for a number of applications. The technical objectives of the program were to investigate the surface modification of metals, ceramics, and other materials by energetic implantation of metal ions and by the deposition of metal plasma, and the interaction of these two processes when applied sequentially or simultaneously. Metal ion implantation was done with a vacuum arc ion source based implantation facility that was developed under prior ARO/ONR funding, and the metal plasma deposition was done using vacuum arc plasma guns. Gaseous species could be added during the implantation and deposition processes as a means of incorporating non-metallic elements into the surface and thus forming films and modified zones (implanted surfaces layers) of compound materials such as oxides and nitrides. Several novel research topics were addressed, as well as one specific sizeable project involving the surface modification of long copper rails from an electromagnetic rail gun. (MM)

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Document Details

Document Type
Technical Report
Publication Date
Mar 31, 1995
Accession Number
ADA295291

Entities

People

  • Ian G. Brown

Organizations

  • University of California, Berkeley

Tags

Communities of Interest

  • Advanced Electronics
  • Energy and Power Technologies

DTIC Thesaurus Topics

  • Abstracts
  • Electron Microscopy
  • Films
  • Gun Components
  • Guns
  • Implantation
  • Ion Beams
  • Ion Implantation
  • Ion Sources
  • Ions
  • Materials
  • Metals
  • Particle Accelerators
  • Test Facilities
  • Thin Films
  • United States
  • Wear Resistance

Readers

  • Plasma Physics.
  • Systems Analysis and Design
  • Thin Film Deposition Science.