Anodization of Copper Microelectrodes in a Complexing Medium: Determination of Stability Constants of Products.

Abstract

A model is presented for the anodization of a metal electrode by normal pulse voltammetry in complexing medium. The analysis is based on analytical expressions for current during normal pulse voltammetry at a microelectrode. It is applied to the anodization of a copper microdisk electrode in aqueous chloride solutions. Optimization of the fit of the model to the data yields the overall formation constants of CuCl (K1) and CuCl2 (beta 2) as log K1 = 2.93 (+0.02, - 0.05), and log beta 2 = 5.54 (+0.12, - 0.17). These values agree with those found in the literature. The advantages of this analysis over traditional approaches which employ an approximation of small current are described. jg p.1

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Document Details

Document Type
Technical Report
Publication Date
Jul 25, 1995
Accession Number
ADA297630

Entities

People

  • James T. Orr
  • Janet G. Osteryoung
  • Kazimierz Wikiel

Organizations

  • North Carolina State University

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  • Materials and Manufacturing Processes

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  • Anodizing
  • Chemistry
  • Chlorides
  • Data Analysis
  • Diffusion Coefficient
  • Electrodes
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  • Measurement
  • Microelectrodes
  • Military Research
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  • Steady State
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  • Voltammetry

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  • Electrochemical Surface Science
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