Hierarchical Process Control of Chemical Vapor Infiltration.
Abstract
This is the final report on the Phase I STTR effort entitled "Hierarchical Process Control of Chemical Vapor Deposition." The work was performed jointly by Technology Assessment and Transfer and the University of Cincinnati (UC). It was shown that not only was process control for CVI feasible, but the anticipated improvements in product quality through increased densification and the reduction in processing time were substantial. Thus, the potential economic impact of this work is considerable, and could lead to a viable production technology. Specifically the University of Cincinnati developed a generic approach to the intelligent processing of materials (IPM), applied simulations of it to CIVI materials processing, and developed a rapid convergence artificial neural network and used it to discover improved regions of the CVI processing parameter space; also, the Technology Assessment & Transfer developed subprocess in situ state models for chemical vapor infiltration (CVI) of silicon carbide fiber preforms, and used them to identify in situ process sensors of considerable promise and as artificial neural network training pairs.
Document Details
- Document Type
- Technical Report
- Publication Date
- May 31, 1995
- Accession Number
- ADA298920
Entities
People
- D. Palaith
- J. Saylor
- Jason C. Jones
- P. Garrett