Evaluation of Pulsed UV-Laser Gas Phase Doping for Fabrication of High Performance Polysilicon TFTs.
Abstract
The primary purpose of this research effort is to investigate and characterize the use of Gas Immersion Laser Doping (GILD) for the fabrication of polysilicon TFTs. To achieve this goal we will be investigating the fabrication of poly-Si mfs using both standard, industrially recognized doping and annealing processes along with and laser processing and annealing. jg p.2
Document Details
- Document Type
- Technical Report
- Publication Date
- Sep 01, 1994
- Accession Number
- ADA299191
Entities
People
- C. N. Berglund
- Thomas W. Sigmon
Organizations
- Arizona State University