A Molecular Beam Epitaxy Growth Technique for Quality 1.5 - 2.5 Micrometers near Infrared Sensing Devices.
Abstract
The objective of this Program is to develop long wavelength, lattice mismatched InGaAs PIN diode structures grown using Molecular Beam Epitaxy (MBE). The overall goal is to generate structures sensitive to the entire near infrared (1.0 - 2.5 micrometers) which take advantage of the uniformity inherent to MBE but with a buffer structure practical for commercialization. The activity during Phase I was centered on an intermediate alloy, In(.74)Ga(.28)As, with optical response out to 2.2 micrometers. By the end of Phase I, PIN diodes were fabricated using thin (less than 3 micrometers), low-temperature linearly graded buffers (LTLGB) of In(x)Ga(1-x)As. The diodes had grown-in p-n junctions and InAlAs passivation caps. Shunt resistivities (RoA) > 75 ohms sq cm, and peak quantum efficiencies > 70% were observed at room temperature. RoA had a temperature dependence with a diode quality factor of n=1 .2. These results were near-commercial in level and represent the first practical alternative to non-uniform vapor phase epitaxy (VPE) material. During Phase II, the conventional planar process (zinc-diffused junctions through an InAsP cap) will be adapted to accommodate the MBE InAlAs cap, the opaque InGaAs LTLGB will be replaced by a transparent InAlAs buffer to enable backside-illuminated devices, and the indium content of the active layer will be increased to 82% for a cutoff wavelength of 2.5 micrometers jg p.3.
Document Details
- Document Type
- Technical Report
- Publication Date
- Mar 30, 1995
- Accession Number
- ADA299283
Entities
People
- Marshall J. Cohen