Exposure of LDEF Materials to Atomic Oxygen: Results of EOIM-III.

Abstract

The third Effects of Oxygen Interaction with Materials (EOIM-III) experiment flew on STS-46 from July 31 to August 8, 1992. The EOIM-III sample tray was exposed to the low-earth orbit space environment for 58.55 h at an altitude of 124 nmi, resulting in a calculated total atomic oxygen (AO) fluence of 1.99 x 10(exp 20) atoms/sq cm. Five samples previously flown on the Long Duration Exposure Facility (LDEF) Experiment M0003 were included on the Aerospace EOIM-III experimental tray: (1) Chemglaze A276 white thermal-control paint from the LDEF trailing edge (TE); (2) Sl3GLO white thermal-control paint from the LDEF TE; (3) S13GLO from the LDEF leading edge (LE) with a visible contamination layer from the LDEF mission; (4) Z306 black thermal-control paint from the LDEF TE with a contamination layer from the LDEF mission; and (5) anodized aluminum from the LDEF TE with a contamination layer from the LDEF mission. The purpose of this experiment was twofold: (1) investigate the response of trailing-edge LDEF materials to atomic-oxygen exposure, thereby simulating LDEF leading-edge phenomena; and (2) investigate the response of contaminated LDEF samples to atomic oxygen in attempts to understand LDEF contamination/atomic-oxygen interactions. jg p.3

Open PDF

Document Details

Document Type
Technical Report
Publication Date
Jul 15, 1995
Accession Number
ADA299289

Entities

People

  • C. H. Jaggers
  • C. S. Hemminger
  • M. J. Meshishnek

Organizations

  • The Aerospace Corporation

Tags

Communities of Interest

  • Advanced Electronics
  • Space

DTIC Thesaurus Topics

  • Air Force
  • Aluminum
  • Body Weight
  • Contamination
  • Earth Orbits
  • Environment
  • Ground Based
  • Leading Edges
  • Low Earth Orbits
  • Materials
  • Measurement
  • Radiation
  • Space Environments
  • Spectra
  • Surface Analysis
  • Titanium Dioxide
  • Trailing Edges

Fields of Study

  • Physics

Readers

  • Space Exploration and Orbital Mechanics.
  • Thin Film Deposition Science.

Technology Areas

  • Space