Thin Film Growth with Ions, Clusters, and Metal Compounds.
Abstract
The central theme of the project involved the interaction of ionized beams with solid surfaces. Such studies are relevant to materials synthesis problems because advanced manufacturing processes involve thin film growth and etching under conditions where energetic ions and clusters are present. While it is known that these ions play an important role, the details of their interactions are poorly understood. A significant part of the program during this funding period dealt with the development of instrumentation that would allow the formation of a beam of ionized clusters, the selection from that beam of those clusters that had a particular mass and energy, and then the deposition of those clusters onto a surface with full control over the parameters of deposition. The source was successfully built and tested. The goal was to study the atomic-scale processes of this ionized cluster beam deposition (ICBD). The plan was to use scanning tunneling microscopy to characterize the clusters that were deposited and to determine the effect on the surface as a function of cluster energy and cluster size. jg p.6
Document Details
- Document Type
- Technical Report
- Publication Date
- Jul 25, 1995
- Accession Number
- ADA299528
Entities
People
- John H. Weaver
Organizations
- University of Minnesota