High-Density Plasma Source for Large-Area Chemical Vapor Deposition of Diamond Films.

Abstract

During this program Science Research Laboratory (SRL) and the Plasma Processing Group in the Department of Chemical Engineering at MIT are developing a large-area, directed plasma/atomic beam source for diamond deposition. The plasma source is based on an inductively-driven plasma accelerator that efficiently produces a high density (l0(exp 14-10(exp 17)/cu cm) plasma over an area of 0.1-1 square meters. The goal of this effort is to experimentally demonstrate the technical feasibility of employing the plasma source for high-throughput diamond deposition, through characterization of plasma parameters and preliminary diamond deposition experiments. A reactor design study will also be completed during Phase I, leading to an engineering design of a large-area plasma reactor for Phase II implementation. The period of performance is from 30 September 1994 to 29 May 1995. jg p.2

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Document Details

Document Type
Technical Report
Publication Date
May 05, 1995
Accession Number
ADA299767

Entities

People

  • Chen Xing

Tags

Communities of Interest

  • Energy and Power Technologies

DTIC Thesaurus Topics

  • Atomic Beams
  • Chemical Engineering
  • Chemical Vapor Deposition
  • Construction
  • Detectors
  • Diamond Films
  • Electric Propulsion
  • Engineering
  • Fabrication
  • High Density
  • High Voltage
  • Low Voltage
  • Military Research
  • Plasma Accelerators
  • Repetition Rate
  • Vapor Deposition
  • Voltage

Fields of Study

  • Physics

Readers

  • Pulsed Power and Plasma Physics.
  • Technical Research and Report Writing.
  • Thin Film Deposition Science.