Photopolymers - Principles, Processes and Materials.
Abstract
Partial contents: Ultraviolet light sources for photopolymerization; Reciprocity failure in films of flash exposed dichromate sensitized polyvinyl alcohol; Sensitometric measurements on Kodak Ortho Resist at microsecond exposure times; Characteristics of images formed in Kodak thin film resist by projection exposures; Photopolymers from monomers - general survey of recent developments; Photoelectrolytic polymerization processes; Photopolymerization studies: I. Polymers from new photoredox catalyst system; Photopolymerization of acrylamide and its derivatives by light-sensitive metal salts; Some fundamental aspects of dye-sensitized photopolymerization; A basic study of novel photopolymerization systems; Surface-photopolymerization of vinyl and diene monomers; Photopolymerization initiators containing strong oxidizing agents. jg p.5
Document Details
- Document Type
- Technical Report
- Publication Date
- Nov 01, 1967
- Accession Number
- ADA301107