Ion Doped Quantum Well Lasers.

Abstract

The objective of this research was to fabricate erbium doped diode lasers which were expected to be temperature independent, frequency stable sources of 1538 nm light optical communications. New metalorganic sources of erbium were developed that enabled metalorganic chemical vapor deposition (MOCVD) of Er:GaAs and AlGaAs structures with low levels of carbon and oxygen. Substitutional doping levels to over 10(exp 20) per cubic centimeter were demonstrated with good photo- and cathode-luminescence properties. LED's and diode laser structures were fabricated with erbium placed (a) so as to be pumped directly by electron hole pair recombination, and (b) by optical absorption at 980um. However, lasing at 1538nm was not observed in either case. The program did result in two commercial products: the erbium metalorganic source chemicals, and laser diode arrays with 980nm emission which can be used to pump erbium glass solid state lasers.

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Document Details

Document Type
Technical Report
Publication Date
Jun 11, 1995
Accession Number
ADA301129

Entities

People

  • Anton Greenwald

Tags

Communities of Interest

  • Advanced Electronics

DTIC Thesaurus Topics

  • Absorption
  • Chemical Reactions
  • Chemical Vapor Deposition
  • Crystal Structure
  • Heat Energy
  • Laser Applications
  • Laser Diodes
  • Lasers
  • Materials
  • Measurement
  • Quantum Well Lasers
  • Quantum Wells
  • Semiconductor Lasers
  • Semiconductors
  • Spectra
  • Spectroscopy
  • Vapor Deposition

Fields of Study

  • Materials science

Readers

  • Optical Physics and Photonics.
  • Semiconductor Device Technology

Technology Areas

  • Directed Energy
  • Directed Energy - Lasers
  • Microelectronics
  • Microelectronics - Graphene
  • Quantum Computing