Pulsed Laser Deposition Improvements by Self-Directed Control.

Abstract

Improvements in material thin coatings for the year 2000 and beyond require a radical new approach to deposition processes. Pulsed Laser Deposition (PLD) is one such deposition process which offers deposition of complex materials currently not possible with other deposition methods. Unfortunately, it is not enough to control thin film material composition, but thin film stoichiometry, micro and macro stress and strain, and thickness as well. It is also desirable to have a deposition process that is easy to use and is repeatable. In order to propel the current thin film deposition culture into accepting PLD as a manufacturing process, the automation of PLD is inevitable. The inception, development, and implementation of PLD automation methods is the aim of this document.

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Document Details

Document Type
Technical Report
Publication Date
May 01, 1995
Accession Number
ADA301474

Entities

People

  • Samuel J. Laube

Tags

Communities of Interest

  • Energy and Power Technologies
  • Sensors
  • Space

DTIC Thesaurus Topics

  • Chemical Vapor Deposition
  • Control Systems
  • Detectors
  • Electron Energy
  • Electron Microscopy
  • Films
  • Lasers
  • Manufacturing
  • Materials
  • Modulus Of Elasticity
  • Physical Properties
  • Pulsed Lasers
  • Quartz Crystal Microbalances
  • Raman Spectra
  • Spectra
  • Spectroscopy
  • Thin Films

Readers

  • Organizational Process Management (OPM).
  • Systems Analysis and Design
  • Thin Film Deposition Science.

Technology Areas

  • Directed Energy
  • Directed Energy - Pulsed-Laser Deposition