Molecular Beam Epitaxial System.
Abstract
During the period of this research grant, two major equipments Molecular Beam Epitaxy (MBE) and X-ray Diffractometer systems were ordered and installed. EPI 930 MBE system that can handle wafers upto 3", substrates have been installed. The system is modular, comprising of a growth chamber, a buffer chamber, and an introduction chamber which are connected through gate valves. The growth chamber is a nine source chamber with full beam monitoring facilities, such as mass spectrometer, ionization gauge and structural monitoring facilities such as RHEED system. The system has been specially designed with optical ports for ellipsometry, ports at grazing incidence to the substrate for in situ desorption measurements, numerous small optical ports near the source flange for the individual flux measurements, and an optical port on the substrate manipulator to measure the substrate temperature from the back of the substrate. The system has the necessary safety features namely, safety interlock system, back up power supply for the group III cells. A closed loop liquid nitrogen system has been installed for the liquid nitrogen transfer to the MBE cryopanel. The growth system is automated by the Molly software package. A Bede 200/D(3) High Resolution X-ray Diffractometer system has been installed. The system has a resolution of 12 arc seconds and is computer software controlled. jg p1
Document Details
- Document Type
- Technical Report
- Publication Date
- Nov 22, 1995
- Accession Number
- ADA302157
Entities
People
- Jie Li
- Shanthi N. Iyer
- Ward J. Collis
Organizations
- North Carolina Agricultural and Technical State University