Defect Formation in Fused Silicas Due to Photon Irradiation at 5 and 50 EV.
Abstract
We have compared the paramagnetic defect formation in two types of pure fused silica glass irradiated with intense photon fluxes at 5 eV (KrF laser) and 50 eV (undulator beam from Aladdin Synchrotron Light Source), using electron paramagnetic resonance spectroscopy with a frequency of 9.7Hz and sample temperatures of 110 and 300K. The 5 eV photons produce approximately 10(exp -14) paramagnetic defects per photon and the 50 eV photons produce approximately 10(exp -5) defects per photon. The ratio of E' centers to oxygen related centers is approx. 10 times greater for 5 eV photons than for 50 eV photons in type III silica.
Document Details
- Document Type
- Technical Report
- Publication Date
- Jan 31, 1991
- Accession Number
- ADA302773
Entities
People
- D. L. Kinser
- G. Escher
- N. H. Tolk
- P. W. Wang
- R. F. Haglund Jr.
Organizations
- Vanderbilt University