Application of X-ray Nanolithography to the Fabrication of Optoelectronic Integrated Circuits.

Abstract

As a result of the research carried out under this grant, we have laid the foundation for an entirely new approach to high performance optoelectronic components for all optical networks utilizing wavelength division multiplexing We have developed both the required nanofabrication technology and the basic components. This work will be continued and expanded under DARPA sponsored MURI funding. New grating based components that promise even higher performance than those described here have recently been conceived, something that would not have occurred except for this grant. These more advanced components will be pursued under the MURI program which will commence in early 1996.

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Document Details

Document Type
Technical Report
Publication Date
Nov 08, 1995
Accession Number
ADA304063

Entities

People

  • Henry I. Smith

Organizations

  • Massachusetts Institute of Technology

Tags

Communities of Interest

  • Human Systems

DTIC Thesaurus Topics

  • Distributed Feedback Lasers
  • Electrical Engineering
  • Electron Beam Lithography
  • Electron Beams
  • Electronics
  • Fabrication
  • Integrated Circuits
  • Lithography
  • Manufacturing
  • Nanofabrication
  • Nanolithography
  • Networks
  • Optical Filters
  • Optoelectronic Devices
  • Wavelength Division Multiplexing
  • X Ray Lithography
  • X Rays

Fields of Study

  • Physics

Readers

  • Integrated Circuit Design and Technology.
  • Software Engineering
  • Technical Research and Report Writing.

Technology Areas

  • Microelectronics