Parallel Fabrication and Electronic Characterization of Nanostructured and Nanoheterostructured Metal Surfaces.
Abstract
We have been pursuing the creation of quantum dot arrays fabricated in crystalline silicon. We wish to produce a two-dimensional array of crystalline Si(c-Si) quantum dots or boxes surrounded by a hydrogenated amorphous Si(a-Si:H) matrix. The quantum dots are to be defined spatially using the protein crystal masking technique described in our research grant and which we now briefly summarize. This nanofabrication technique is implemented using two-dimensional crystalline protein monolayers which are deposited on a substrate, metal shadowed at oblique incidence with an ultrathin (approx. 1 nm) titanium film, and then ion milled at normal incidence. During milling the metal film is reconfigured through a combination of sputtering and surface diffusion leaving a periodically nanostructured, ultrathin metal(oxide) film. Moreover, we have found that this nanostructured screen acts as a mask for the pattern transfer of a periodic array of holes or etch pits to the underlying substrate, which in the present case is silicon. jg p3
Document Details
- Document Type
- Technical Report
- Publication Date
- Feb 12, 1996
- Accession Number
- ADA304296
Entities
People
- Kenneth Douglas
Organizations
- University of Colorado Boulder