Real-Time, Self-Directed MBE Flux Control Incorporating in Situ Ellipsometry. Phase 2.

Abstract

The purpose of this program was to develop a process control technology that would be generally applicable for advanced materials processing and to transfer that technology to end users in industry and government. The specific goal was to apply the control concepts to fabrication of electronic and optoelectronic devices by thin film deposition using molecular beam epitaxy (MBE). MBE was chosen because it is the favored technique and yet suffers from long deposition times and relatively high device rejection rates. The key results of this effort are detailed in this report. They include the development of a data logger, PID temperature control module with feed forward temperature compensation development, data logger and control module testing at the Materials Directorate and the Laboratory for Physical Sciences (LPS), along with future testing plans.

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Document Details

Document Type
Technical Report
Publication Date
Dec 01, 1995
Accession Number
ADA305553

Entities

People

  • David Palaith

Tags

DTIC Thesaurus Topics

  • Advanced Materials
  • Films
  • Materials
  • Materials Laboratories
  • Materials Processing
  • Molecular Beam Epitaxy
  • Molecular Beams
  • Optoelectronic Devices
  • Physical Sciences
  • Temperature Control
  • Thin Films
  • Transition Temperature

Readers

  • Robotics and Automation.
  • Software Engineering
  • Thin Film Deposition Science.

Technology Areas

  • Microelectronics