Chemical Vapor Deposited Permeation Barriers in Teflon Expulsion Bladders,

Abstract

This paper will primarily deal with the reduction of N(2)O(4) permeation in Teflon expulsion bladders, through the utilization of chemical vapor deposited aluminum coatings thicknesses from 0.0001 to 0.001 inches. The primary purpose of this work was to develop a high reliability process to incorporate continuous, conforming, aluminum permeation barriers within Teflon wall constructions. p1

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Document Details

Document Type
Technical Report
Publication Date
May 01, 1968
Accession Number
ADA306464

Entities

People

  • D. F. Bazzarre
  • John Petriello

Tags

Communities of Interest

  • Advanced Electronics
  • Energy and Power Technologies

DTIC Thesaurus Topics

  • Alkenes
  • Coatings
  • Construction
  • Crystal Structure
  • Crystals
  • Electron Microscopes
  • Electron Microscopy
  • Expulsion Bladders
  • Films
  • Jet Propulsion
  • Materials
  • Mechanical Properties
  • Microscopes
  • Microscopy
  • Physical Properties
  • Scanning Electron Microscopes
  • Scanning Electron Microscopy

Readers

  • Fluid Dynamics.
  • Materials Science
  • Thin Film Deposition Science.