Kinetic Effects in the Chemistry of Diamond CVD Source Gases and Implications for Diamond Growth,

Abstract

Perfectly stirred reactor calculations have been carried out on six different gas mixtures containing ethanol, water, methane, acetylene, oxygen, and hydrogen at conditions typical of low-pressure (approx. 1 Torr) diamond chemical vapor deposition (CVD) reactors. For reactors operating under conditions in which the flow or diffusive time scales are short compared to the chemical time scales, the selection of viable source-gas mixtures for diamond growth based solely on the overall C-H-O stoichiometry becomes impossible and kinetic effects must be taken into account. Numerical results are presented which show the dependence of the maximum theoretical diamond deposition rate and diamond quality as a function of mass flow rate.

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Document Details

Document Type
Technical Report
Publication Date
Mar 22, 1996
Accession Number
ADA307011

Entities

People

  • C. R. Devore
  • Robert S. Sinkovits
  • Vasgen A. Shamamian

Organizations

  • United States Naval Research Laboratory

Tags

DTIC Thesaurus Topics

  • Acetylenes
  • Alkynes
  • Chemical Vapor Deposition
  • Chemistry
  • Flow
  • Flow Rate
  • Mass Flow
  • Materials Science
  • Vapor Deposition

Readers

  • Combustion science or combustion engineering.
  • Thin Film Deposition Science.