Applications of Signal Processing, Fast Algorithms and Multivariable Control to Semiconductor Manufacturing.
Abstract
The aim of this project was to demonstrate that a systems based methodology, utilizing the tools of fast algorithms, signal processing, and multivariable control, can make a significant difference to the efficient solution of various critical problems in the fields of semiconductor manufacturing and materials processing. Specifically, the following developments were achieved: (1) A robust multivariable control algorithm for use in several types of rapid thermal processes including oxidation, annealing, and silicidation as well as single-wafer chemical vapor deposition processes: (2) Introduction of novel signal processing techniques into a recently proposed acoustics based technique for noninvasive temperature measurement of RTP wafers; (3) Subspace based image processing strategies for defect inspection of periodic patterns in patterned wafers, distortion compensation for accurate overlay in lithography of quasiperiodic patterns, circle and ellipse fitting, and critical dimension measurement; and (4) Fast algorithms for the systematic design of phase-shifting masks.
Document Details
- Document Type
- Technical Report
- Publication Date
- Dec 31, 1995
- Accession Number
- ADA308274
Entities
People
- Thomas Kailath
Organizations
- Stanford University