Nanolithography of Semiconductor Structures Using Scanning Probe Microscopy.

Abstract

The work reported here consisted of the fabrication and characterization of Si nano- and micro-structures useful for electronic and optical applications. The fabrications were all done in an ultrahigh vacuum chamber (UHV), and the characterization was accomplished by using air and UHV scanning tunneling microscopy (STM), atomic force microscopy (AFM) infrared (IR) spectra, high resolution transmission electron microscopy (HRTEM), scanning electron microscopy (SEM) and optical microscopy.

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Document Details

Document Type
Technical Report
Publication Date
Jan 01, 1995
Accession Number
ADA308953

Entities

People

  • Dror Sarid

Organizations

  • University of Arizona

Tags

DTIC Thesaurus Topics

  • Electron Microscopy
  • Electrons
  • Fabrication
  • High Resolution
  • Microscopy
  • Nanolithography
  • Scanning
  • Scanning Electron Microscopy
  • Semiconductors
  • Transmission Electron Microscopy
  • Ultrahigh Vacuum
  • Vacuum
  • Vacuum Chambers

Fields of Study

  • Materials science
  • Physics

Readers

  • Nanoscale Plasmonic Nanotechnology
  • Thin Film Deposition Science.

Technology Areas

  • Microelectronics
  • Microelectronics - Graphene