Radiation-Hard High-Efficiency InP Space Solar Cell Development. Phase 1.

Abstract

The efficiency of InP cells was improved to 19.1% AM0, using a cell fabrication process amenable to scale-up to production levels, and increasing the cell area to 4 cm2. An n+/p/p+ shallow-homojunction structure, fabricated by metalorganic chemical vapor deposition was used for this work. The emitter thickness was in the neighborhood of 30 nm, and a graded doping profile (front-surface-field) was used. Two hundred cells and two complete 20-cell panels were fabricated for space flight tests. Thermal cycling and radiation tests were carried out on these cells.

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Document Details

Document Type
Technical Report
Publication Date
Jul 01, 1996
Accession Number
ADA310729

Tags

Communities of Interest

  • Advanced Electronics

DTIC Thesaurus Topics

  • Antireflection Coatings
  • Chemical Vapor Deposition
  • Chemistry
  • Coatings
  • Crystal Lattices
  • Crystals
  • Low Temperature
  • Materials
  • Materials Processing
  • Measurement
  • Optical Coatings
  • Optical Materials
  • Quantum Efficiency
  • Radiation Effects
  • Semiconductor Devices
  • Semiconductors
  • Test And Evaluation

Fields of Study

  • Materials science

Readers

  • Software Engineering
  • Solar Photovoltaics and Thermoelectric Devices.
  • Thin Film Deposition Science.

Technology Areas

  • Space
  • Space - Hall-Effect Thruster