Manufacturing & Optimization Problems of Electromagnetic Devices.

Abstract

During the duration of this project, we have developed several new algorithms for simulation of microstructures, devices, and fabrication methods for IC technology. We have interacted extensively with both industrial and government labs and collaborated with personnel of both. We have developed algorithms for imaging of microstructures, investigated the effects of off-axis illumination and finite-thickness effects on mask imaging. Furthermore, we have investigated the effects of post-exposure baking on chemically amplified resists, optimized stepper parameters, as well as proximity effects on mask making. Last, but not least, we developed new visualization algorithms that allow multiple viewing of the microchip processes.

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Document Details

Document Type
Technical Report
Publication Date
Jun 30, 1996
Accession Number
ADA315582

Entities

People

  • E. J. Barouch

Organizations

  • Clarkson University

Tags

Communities of Interest

  • Air Platforms
  • Energy and Power Technologies

DTIC Thesaurus Topics

  • Algorithms
  • Computational Science
  • Computations
  • Electric Fields
  • Fabrication
  • Frequency
  • Integrated Circuits
  • Manufacturing
  • Manufacturing Engineering
  • Numerical Analysis
  • Numerical Aperture
  • Optimization
  • Phase Shift
  • Scattering
  • Simulations
  • Three Dimensional
  • Transfer Functions

Readers

  • Auditory Neuroscience/Auditory Physiology.
  • Computational Modeling and Simulation
  • Nanofabrication and Microfabrication.