Growth Facility for Nanocomposite Films.
Abstract
Two facilities were constructed for synthesis of protective thin films. The first system utilized the recently developed Laser Absorption Wave Deposition (LAWD) technique. With this technique multiple layers of ultrahard carbon films can be grown directly on a variety of surfaces. A pulsed infrared laser is used to create a highly ionized plasma in an atmosphere of a gas mixture, such as methane in hydrogen, into which a plume of ablation particles from a suitably placed target are brought. The ablation particles can be coated and deposited on a substrate. The second system utilized Electron Cyclotron Resonance Plasma Enhanced Chemical Vapor Deposition (ECR-PECVD). This technique can be used to grow a wide variety of thin films using a microwave plasma source. The energy of arriving adatoms varies from a few to several hundred eV. Films will be grown and characterized under a three year, separately funded ARO program for the growth of protective films on structural substrates such as Fe, W and Ta.
Document Details
- Document Type
- Technical Report
- Publication Date
- Sep 23, 1996
- Accession Number
- ADA316558
Entities
People
- Henry W. White
Organizations
- University of Missouri